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RF Magnetron Sputtering System
RF/DC Magnetron Sputtering System:
Reactor: Stainless Steel 304L SS or 316 SS.
Magnetron Sputtering Cathode: Cathode has perfect design. Maximum power can be applied without much reflected power loss with perfect gas shower design.
Substrate: Heating arrangement maximum up to 800°C with substrate rotation facility & RF/DC bias application provision.
Gas Manifold: Made from SS tubes 316, Pneumatic ON/OFF valves, Particle filters & Mass flow controllers.
Pumping Line: High vacuum line, Pneumatic ON/OFF valves. Auto throttle valve with pressure controlled system ,
Vacuum System: Vacuum better than 10-7 Torr. based on Turbo/Diffusion pump back by Rotary Vacuum pump, Penning Pirani vacuum gauges
RF Power supply: Matching network, L.F. filter with self -bias measurement & DC power supply.
Control Panel : Manual and or PLC controlled
Safety : Completely Safety Interlocked
- Contact Details
- OMICRON SCIENTIFIC EQUIPMENT CO.