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Home » Products » Semiconductor Processing Equipments » RF Magnetron Sputtering System

RF Magnetron Sputtering System

RF Magnetron Sputtering System
RF Magnetron Sputtering System
Product Code : 01
Brand Name : OMICRON SCIENTIFIC EQUIPMENT CO.
Product Description

RF/DC Magnetron Sputtering System:

  • Reactor: Stainless Steel 304L SS or 316 SS.

  • Magnetron Sputtering Cathode: Cathode has perfect design. Maximum power can be applied without much reflected power loss with perfect gas shower design.

  • Substrate: Heating arrangement maximum up to 800°C with substrate rotation facility & RF/DC bias application provision.

  • Gas Manifold: Made from SS tubes 316, Pneumatic ON/OFF valves, Particle filters & Mass flow controllers.

  • Pumping Line: High vacuum line, Pneumatic ON/OFF valves. Auto throttle valve with pressure controlled system ,

  • Vacuum System: Vacuum better than 10-7 Torr. based on Turbo/Diffusion pump back by Rotary Vacuum pump, Penning Pirani vacuum gauges

  • RF Power supply: Matching network, L.F. filter with self -bias measurement & DC power supply.

  • Control Panel : Manual and or PLC controlled

  • Safety : Completely Safety Interlocked


OMICRON SCIENTIFIC EQUIPMENT CO.

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  • Contact Details
  • OMICRON SCIENTIFIC EQUIPMENT CO.
  • 309, Vardhman Sudarshan Plaza, Plot No. 4, MLU, Sector-5, Dwarka, New Delhi - 110075, India
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  • Mr. Sanjeev Kumar Dixit (Director)
  • Dr. P. N. Dixit